AS-One : versatile rapid thermal processing furnace

RTA system for R&D applications and small scale production.

Annealsys’ AS-One RTP system is a versatile machine perfectly adapted to R&D for RTA and other rapid thermal deposition processes. It is available with two types of reactors to process substrates up to 100mm or 150mm and can perform annealing processes up to 1450°C in 100mm configuration.

In terms of control, pyrometer and temperature measurement via thermocouple come as standard. The digital PID controller is fast and provides accurate and repeatable control across the temperature range.

This system has been developed for labs, research centers and small scale production. It is perfectly adapted to clean room applications thanks to its reduced footprint and easy access for maintenance operations.

 

Technical specifications

Reactor technology

Stainless steel cold wall chamber technology

Temperature control

TCs, pyrometer & digital PID

RTP heating system

Crossed-lamp IR Technology

Cooling rate

Up to 100°C/s

Temperature range

Up to 1450°C

Process

Atmosphere to 10-6 Torr

Temperature uniformity (typical)

±1°C

Robotic integration

Compatibility with Automation & Robotics : with ECM Robotics

Ramp rate

1°C/s to 200°C/s

100, 150 mm diameter

  • Graphite and silicon carbide coated susceptor
  • Rough vacuum pump & turbo pump
  • Automatic pressure control with throttle valve
  • Fast cooling system
  • Selenization kits
  • Semiconductor
  • Optoelectronic
  • Microelectronics
  • MEMS
  • Photovoltaic
  • Silicon
  • Steel
  • Glass
  • III-V
  • II-VI

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