The rapid thermal deposition processes based on Chemical Vapor Deposition are named Rapid Thermal Chemical Vapor Deposition Processes (RTCVD).

ECM Lab Solutions offers Jetstar furnace for RTCVD application.

Highlights :

. In RTCVD, gases are injected and react with the surface of the fast heated substrate to form a thin layer.

. Reaction gases are introduced at controlled rate into an atmospheric or low-pressure environment. 

. Several different gases may have to be supplied and programmed in various ratios to optimize these processes. 

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Rapid Thermal Chemical Vapor

Rapid Thermal Chemical Vapor | ECM Lab Solutions

Rapid Thermal Chemical Vapor – ECM Lab Solutions offers JETSAR furnaces to ensure optimal RTCVD processes for Semiconductor and Solar applications