Jetfirst

BENCH-TOP RTP FURNACE

ECM Technologies’ JetFirst system is the most popular bench-top lamp furnace in the ECM Lab Solutions range. This RTP (rapid thermal processing) system is versatile, software controlled, and cost-effective. It consists of a compact and robust halogen lamp with a metallic water cooled reactor chamber to maintain an ultra-low memory effect. The user-friendly operating interface is clearly structured and ensures for a quick system start-up in just a few hours. The temperature measurement control system provides accurate and repeatable thermal control across the temperature range. The lamp array, upper flange, and quartz window are mounted in a rotating top lid giving full access to the chamber for easy loading and unloading of the wafer. Silicon carbide coated graphite susceptors are also available for the processing of various small samples and compound semi materials. A PID system provides accurate and repeatable thermal control across the temperature range, and running PIMS via a computer-dedicated supervisor enables recipe programming and monitoring of the entire RTP system. The high reliability and performance of the JetFirst adheres to small-scale production requirements, and the bench-top design allows for a quick and easy installation in lab facilities.

Features

Reactor technology

Water cooled metal chamber

RTP heating system

Crossed-lamp IR Technology

Temperature range

RT to 1200°C

Temperature uniformity (typical)

±1°C

Ramp rate

1°C/s to 200°C/s

Temperature control

TCs, Pyrometer & digital PID

Cooling

Fan & water-cooled reflector

Process

Atmospheric pressure or under vacuum (with the use of gas or not)

Substrate size

100, 200, 300 mm diameter

Options

  • Primary vacuum pump, Secondary vacuum pump
  • Susceptor
  • Secondary vacuum configuration , Diffusion pump, Turbo pump, Cryogenic pump
  • Spare chamber
  • Hydrogen configuration
  • Software-controlled, and stand-alone single chamber reactor
  • Cold wall design for process reproducibility
  • Multizone halogen lamp heater
  • Gas introduction lines Up to 4 MFC-controlled 
  • Atmospheric and high vacuum process capabilities
  • Solar Applications : Square chamber available for solar applications
  • Qualification : Single-wafer RTP furnace for process engineering and qualification
  • Lamp Technology : High-performance crossed lamp technology
  • Gas introduction capability

Integration

Compatibility with Automation

APPLICATION

Rapid thermal process (RTP)
RTA
RTO
RTN
Crystallization
Densification
Selenization
Carbonization

INDUSTRY

SEMI
Optoelectronic
Microelectronics
MEMS
PV

 

MATERIAL

Silicon
Steel
Glass
III-V
II-VI

 

Related products

Batch Type RTP Furnace
Tubular batch type furnace
Standalone RTP Furnace
46 rue Vaujany – Technisud
38029 Grenoble cedex 2 France
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RTP furnace

RTP furnace for laboratory applications and production

RTP furnace for R&D applications and small to medium scale production. The Jetfirst system is compact and can be robotized in line in case of higher volumes