PV80 : DSS furnace G2

Directional solidification system furnace of silicon ingot crystal growth for photovoltaic applications.

The PV80 furnace is a directional solidification furnace from ECM Lab Solutions. It is ideal for G2 silicon ingot crystallization, up to 80 kg, and adheres to directional solidification process engineering requirements at laboratory or pilot scale. The PV80 furnace is available with Crystalmax® cast-mono technology and is designed with a three-zone thermal set-up. This set-up enables high reliability, reproducibility, and flexibility in the process growth of silicon ingots. The furnace is user friendly and designed specifically for research and development.

Features

Vessel

Water cooled double walls made of stainless steel (Cold wall technology)

Vacuum

Ultimate vacuum level 1.10-3mbar

Working vacuum level: from 1.10-2 to 1.10-3mbar

Pressure

Partial pressure of Argon neutral gas

Maximal pressure patm+50mbar

Maximum temperature

1550°C (1575 °C)

Heaters

120 KW, 3 heating zones

Safety

Optimised design to limit the consequences of a silica crucible breakage

Maximum heating rate

500 °C/hour

Heating elements

Graphite

Insulation casing

60 mm graphite

Ingot

Dimensions : G2, suitable to cut 4 bricks (156×156 mm²)

Weight : Up to more than 80 kg

Growing technology : CrystalMax® cast-mono, HP-multi or multicrystalline

Ergonomics

Loading : Bottom loading /unloading, safe and easy

Supervision : Touchscreen interface

Operation modes : Fully automatic thermal cycle or manual mode

Effective dimensions

550mm*550mm*750mm

Options

Accelerated / forced cooling

Integration

Turnkey Line

APPLICATION

Ingot Crystallization

INDUSTRY

PV (Solar) Renewable Energy

MATERIAL

Silicon

Related furnaces

DSS furnace G1

PV20

Crystal growth furnace

Czochralski Puller (CZ)

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