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Diffusion is a high-temperature process typically used to electrically activate impurities introduced by ion implantation and also drive dopants deeper into a film layer. 

ECM Lab Solutions offers Tubestar Furnace for Diffusion application.

Highlights :

. Reduced pressure operating conditions in the tubes prevent over-saturation of the doping sources, and results in a more homogeneous flow distribution, which saves process gas and produces better quality electronic devices.

. Performing diffusion in a batch reactor enables to accurately control temperature and ambient conditions, simultaneously, for a large number of wafers, thus increasing productivity. 

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Diffusion process

Diffusion process for Semiconductor & Solar | ECM Lab Solutions

Diffusion process – ECM Lab Solutions offers TUBESTAR furnaces to ensure optimal Diffusion processes for Semiconductor and Solar applications