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Semiconductor :
OXIDATION process

Working principle of oxidation process

Oxidation is the process used in semiconductor applications that form a silicon oxide layer on the wafer‘s surface to deposit oxide insulating layers.

ECM Lab Solutions offers Tubestar Furnace for Oxidation application.

Oxidation potentials can be adjusted specifically by mixtures of air with neutral gases or by tempering of reducing gases by bubblers or steam.

That way, alloy components can be oxidized selectively and certain oxidation steps of elements can be produced. 

Discover Tubestar furnace