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Low Pressure Chemical
Vapor Deposition (LPCVD)

What is Low Pressure Chemical Vapor Deposition ?

Low Pressure Chemical Vapor Deposition (LPCVD) is a thermal process that deposits various films at low pressure for semiconductor and solar applications.

It is adapted for the deposition of a wide range of materials, for example : BSG/PSG, Low stress nitride, polysilicon. 

ECM Lab Solutions offers Tubestar Furnace for LPCVD application.

Discover Tubestar furnace