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Semiconductor

LPCVD

Low Pressure Chemical Vapor Deposition (LPCVD) is a thermal process that deposits various
films at low pressure for semiconductor and solar applications.

Highlights :

It is adapted for the deposition of a wide range of materials, for example: BSG/PSG, Low stress nitride, polysilicon. 

ECM Lab Solutions offers Tubestar Furnace for LPCVD application.

related products

Low Pressure Chemical Vapor

Low Pressure Chemical Vapor | ECM Lab Solutions

Low Pressure Chemical Vapor – ECM Lab Solutions offers Tubestar furnaces to ensure optimal LPCVD processes for Semiconductor and Solar applications