Features
Reactor technology
Stainless steel cold wall process chamber
RTP heating system
Crossed-lamp IR Technology
Temperature range
Up to 1450°C
Temperature uniformity (typical)
±1°C
Ramp rate
1°C/s to 200°C/s
Temperature control
TCs, Pyrometer & digital PID
Cooling rate
Up to 100°C/s
Process
Atmosphere to 10-6 Torr
Substrate size
100, 150mm diameter
Options
- Graphite and silicon carbide coated susceptor
- Rough vacuum pump and turbo pump, automatic pressure control with throttle valve
- Fast cooling system
- Selenization kits
Integration
Compatibility with Automation
APPLICATION
Rapid thermal process (RTP)
RTA
RTO
RTN
Crystallization
Densification
Selenization
Carbonization
INDUSTRY
SEMI
Optoelectronic
Microelectronics
MEMS
PV
MATERIAL
Silicon
Steel
Glass
III-V
II-VI