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AS-One : versatile rapid thermal processing furnace

RTA system for R&D applications and small scale production.

Annealsys’ AS-One RTP system is a versatile machine perfectly adapted to R&D for RTA and other rapid thermal deposition processes. It is available with two types of reactors to process substrates up to 100mm or 150mm and can perform annealing processes up to 1450°C in 100mm configuration.

In terms of control, pyrometer and temperature measurement via thermocouple come as standard. The digital PID controller is fast and provides accurate and repeatable control across the temperature range.

This system has been developed for labs, research centers and small scale production. It is perfectly adapted to clean room applications thanks to its reduced footprint and easy access for maintenance operations.

 

Features

Reactor technology

Stainless steel cold wall process chamber

RTP heating system

Crossed-lamp IR Technology

Temperature range

Up to 1450°C

Temperature uniformity (typical)

±1°C

Ramp rate

1°C/s to 200°C/s

Temperature control

TCs, Pyrometer & digital PID

Cooling rate

Up to 100°C/s

Process

Atmosphere to 10-6 Torr

Substrate size

100, 150mm diameter

Options

  • Graphite and silicon carbide coated susceptor
  • Rough vacuum pump and turbo pump, automatic pressure control with throttle valve
 
  • Fast cooling system
 
  • Selenization kits

Integration

Compatibility with Automation

APPLICATION

Rapid thermal process (RTP)
RTA
RTO
RTN
Crystallization
Densification
Selenization
Carbonization

INDUSTRY

SEMI
Optoelectronic
Microelectronics
MEMS
PV

 

MATERIAL

Silicon
Steel
Glass
III-V
II-VI

 

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46 rue Vaujany – Technisud
38029 Grenoble cedex 2 France
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RTA furnace

Rapid thermal annealing

RTA system for R&D applications and small scale production. The Annealsys AS-One system is compact perfectly adapted to clean room environment.