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AS-Micro : economical rapid thermal processing furnace

Rapid thermal annealing system for universities and R&D applications.

Annealsys’ AS-Micro RTA system is an economic yet very powerful 3-inch RTP system. It is a compact machine dedicated to universities and research applications, which can perform several atmospheric processes or under vacuum. Its performance allows it to be the fastest ramp up rate up to 250°C per second for 2-inch wafers.

The AS-Micro is available in a two chamber configuration to avoid cross contamination issues, and is compatible with an optional glove box interface.

It can process substrates from few square millimeters up to 3-inch diameter or square. Even though the AS-Micro is an economical system, it is still full PC control ready and it can be fitted with up to 5 process gas lines with digital mass flow controllers.

Features

Reactor technology

Stainless steel cold wall process chamber

RTP heating system

Crossed-lamp IR Technology

Temperature range

Up to 1250°C

Temperature uniformity (typical)

±1°C

Ramp rate

1°C/s to 250°C/s on 2-inch substrates

Temperature control

TCs & digital PID

Cooling rate

Up to 100°C/s

Process

Atmosphere to 10-6 Torr

Substrate size

Up to 3-inch wafers

Options

  • Graphite and silicon carbide coated susceptor
  • Rough vacuum pump & turbo pump
 
  • Pyrometer temperature control
 
  • Downstream pressure control with throttle valve

Integration

Compatibility with Automation

APPLICATION

Rapid thermal process (RTP)
RTA
RTO
RTN
Crystallization
Densification
Selenization
Carbonization

INDUSTRY

SEMI
Optoelectronic
Microelectronics
MEMS
PV

 

MATERIAL

Silicon
Steel
Glass
III-V
II-VI

 

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Economical RTA furnace

Rapid thermal annealing system

The AS-Micro is an economical RTA system for universities and R&D applications. This Annealsys RTP system is compact yet performant for 3-inch substrates.