Annealsys’ AS-Micro RTA system is an economic yet very powerful 3-inch RTP system. It is a compact machine dedicated to universities and research applications, which can perform several atmospheric processes or under vacuum. Its performance allows it to be the fastest ramp up rate up to 250°C per second for 2-inch wafers.

The AS-Micro is available in a two chamber configuration to avoid cross contamination issues, and is compatible with an optional glove box interface.

It can process substrates from few square millimeters up to 3-inch diameter or square. Even though the AS-Micro is an economical system, it is still full PC control ready and it can be fitted with up to 5 process gas lines with digital mass flow controllers.