AS-Premium : rapid thermal annealing system

RTA system for the processing of silicon and compound semiconductor wafers.

The Annealsys AS-Premium Rapid thermal annealing system (RTA) is dedicated to the processing of silicon and compound semiconductor wafers up to 150 mm diameter or square. This machine is perfectly adapted either for R&D applications or as for production. It performs to a temperature up to 1300°C and can support several atmospheric or vacuum processes.

The AS-Premium is also a flexible system thanks to its multiconfiguration capabilities. It can be loaded manually or by a cassette to cassette robot. In addition, it is equiped with a square process chamber that makes it suitable for the processing of photovoltaic substrates up to 6 inch by 6 inch.

Technical specifications

Process chamber

Stainless steel cold wall chamber technology

Temperature control

TCs & digital PID

RTP heating system

Crossed-lamp IR Technology

Cooling rate

Up to 100°C/s

Temperature range

Standard version : 1100°C

Option up to 1200°C

Process

Atmosphere to 10-6 Torr

Temperature uniformity (typical)

±1°C

Robotic integration

Compatibility with Automation & Robotics : with ECM Robotics

Ramp rate

1°C/s to 250°C/s on 2-inch substrates

Substrate size

Up to 150 mm diameter wafers or 6-inch by 6-inch square.
Small substrates using susceptors

Options

Graphite and silicon carbide coated susceptor
Rough vacuum pump & turbo pump
Automatic pressure control with throttle valve
Fast cooling system, Selenization kits

Applications

Rapid Thermal Annealing (RTA)

Selenization & Sulfurization

Rapid Thermal Oxidation (RTO)

Diffusion

Ohmic contact annealing

Densification & Crystallization

Industry

Semiconductor
Optoelectronic
Microelectronics
MEMS
Photovoltaic

Material

Silicon
Steel
Glass
III-V
II-VI

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