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Jetlight : batch type RTP furnace

RTP furnace for laboratory and R&D applications

ECM Technologies JetLight is the entry-level, desktop controlled furnace for ECM Lab Solutions. It is a compact and yet robust, high speed heat treatment system with a wide range of material substrates for rapid thermal annealing (RTA). The furnace is equipped with a tubular quartz reaction chamber, and the lamp array, upper flange, and quartz window are mounted in a rotating top lid, which gives full access to the chamber for easy wafer loading and unloading. Silicon carbide coated graphite susceptors are available for various small sample and compound semi materials processing. A PID system also provides accurate and repeatable thermal control across the temperature range. The high reliability and performance characteristics allow for small-scale production. These make the JetLight system ideal for meeting the needs of universities and research centers looking for RTP systems in a multi-user environment.

Features

Reactor technology

Water cooled metal chamber

RTP heating system

Crossed-lamp IR Technology

Temperature range

RT to 1000°C

Temperature uniformity (typical)

±1°C

Ramp rate

1°C/s to 200°C/s

Temperature control

TCs, Pyrometer & digital PID

Cooling

Fan & water-cooled reflector

 

Process

Atmospheric pressure or under vacuum (with the use of gas or not)

 

Substrate size

2-inch diameter (up to 50 mm diameter) and Maximum length of 150 mm

Options

  • Primary vacuum, pump
  • Susceptor
  • Software-controlled stand-alone single chamber reactor
  • Hot wall chamber design
  • Microprocessor-controlled, thyristor technology
  • Up to 2 MFC , controlled gas introduction lines
  • Atmospheric and vacuum process capabilities
  • PID temperature control through thermocouples

Integration

Compatibility with Automation

INDUSTRY

SEMI
Optoelectronic
Microelectronics
MEMS
PV

MATERIAL

Silicon
Steel
Glass
III-V
II-VI

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