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Memslab furnace
memslab furnace technology
memslab furnace technology

Memslab : batch type vertical furnace

PECVD furnace for high quality thin film deposition

The Memslab is the Semco compact batch-type vertical PECVD furnace from ECM Lab Solutions. The Memslab is designed and built with high precision components, which allows for high quality thin film deposition. The applied Low Frequency Plasma feature permits the furnace to reach excellent passivation properties through a most advantageous horizontal thin substrate processing. This platform excels in the processing of small quantities of substrates; therefore, allowing the Memslab to meet requirements of universities, research laboratories, or small production facilities.

Technical specifications

Features

  • Direct Plasma, Low RF
  • Full & single surface deposition or etching
  • Gas Cabinet for up to 13 gas distribution
  • Gas panel with up to 9 MCF gas loops
  • Thin wafer compliant
  • Desne layer, good wet chemical resistance
  • Super deposition uniformity
  • Automatic chamber loading
  • Optional wafer transfer system integration

Robotic integration

Compatibility with Automation & Robotics : with ECM Robotics

  • Up to 200 mm (Round wafer)
  • Up to 166*166 mm (Square wafer)
  • Alternative graphite plates for smaller samples
  • Modular and flexible design and tiny footprint
  • 1 to 4 independent or siamese process chamber
  • Configurable for 25/50 or 50/100
  • Medical
  • Aerospace
  • Semiconductor
  • Microelectronics
  • optoelectronic
  • Fiber optic
  • GaN
  • SiC
  • Metal
  • III-V
  • II-VI
  • Superconductors
  • Silicon
All our Semiconductor furnaces

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