The rapid thermal deposition processes based on Chemical Vapor Deposition are named Rapid Thermal Chemical Vapor Deposition Processes (RTCVD).
ECM Lab Solutions offers Jetstar furnace for RTCVD application.
In RTCVD, gases are injected and react with the surface of the fast heated substrate to form a thin layer.
Reaction gases are introduced at controlled rate into an atmospheric or low-pressure environment.
Several different gases may have to be supplied and programmed in various ratios to optimize these processes.
ECM Lab Solutions offers furnaces for various semiconductor applications such as :
Standalone RTP furnace with multi-zone control system.
Processes : RTP, RTA, RTO, RTN, Crystallization, Densification, Selenization, Carbonization, RTCVD.
