Diffusion furnace

Tubestar furnace, for diffusion process.

tubestar furnace

Tubestar

Batch type horizontal
furnace

A Batch Type Tube furnace for RTP and
deposition processes.

What is diffusion in wafer process ?

Diffusion is a high-temperature process typically used to electrically activate impurities introduced by ion implantation and also drive dopants deeper into a film layer. 

Reduced pressure operating conditions in the tubes prevent over-saturation of the doping sources, and results in a more homogeneous flow distribution, which saves process gas and produces better quality electronic devices.

Performing diffusion in a batch reactor enables to accurately control temperature and ambient conditions, simultaneously, for a large number of wafers, thus increasing productivity. 

Do you have a question or a project ?

Would you like more information, to entrust us with a project or meet our teams ? Fill in our form and our teams will get back to you as soon as possible!