OXIDATION FURNACE
Tubestar furnace, for oxidation process.
Tubestar
Batch-type horizontal
furnace
A Batch Type Tube furnace for RTP
and deposition processes.
Oxidation furnace working principle
Oxidation is the process used in semiconductor applications that form a silicon oxide layer on the wafer‘s surface to deposit oxide insulating layers.
Oxidation potentials can be adjusted specifically by mixtures of air with neutral gases or by tempering of reducing gases by bubblers or steam.
That way, alloy components can be oxidized selectively and certain oxidation steps of elements can be produced.
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