Contact us
as-micro furnace

AS-Micro : economical rapid thermal processing furnace

Rapid thermal annealing system for universities and R&D applications.

Annealsys’ AS-Micro RTA system is an economic yet very powerful 3-inch RTP system. It is a compact machine dedicated to universities and research applications, which can perform several atmospheric processes or under vacuum. Its performance allows it to be the fastest ramp up rate up to 250°C per second for 2-inch wafers.

The AS-Micro is available in a two chamber configuration to avoid cross contamination issues, and is compatible with an optional glove box interface.

It can process substrates from few square millimeters up to 3-inch diameter or square. Even though the AS-Micro is an economical system, it is still full PC control ready and it can be fitted with up to 5 process gas lines with digital mass flow controllers.

Technical specifications

Reactor technology

Stainless steel cold wall process chamber

Temperature control

TCs & digital PID

RTP heating system

Crossed-lamp IR Technology

Cooling rate

Up to 100°C/s

Temperature range

Up to 1250°C

Process

Atmosphere to 10-6 Torr

Temperature uniformity (typical)

±1°C

Robotic integration

Compatibility with Automation & Robotics : with ECM Robotics

Ramp rate

1°C/s to 250°C/s on 2-inch substrates

Up to 3-inch wafers

  • Graphite and silicon carbide coated susceptor
  • Rough vacuum pump & turbo pump
  • Pyrometer temperature control
  • Downstream pressure control with throttle valve

Rapid Thermal Processing (RTP)

RTA

RTO

RTN

Crystallization

Densification

Selenization

Carbonization

  • Semiconductor
  • Optoelectronic
  • Microelectronics
  • MEMS
  • Photovoltaic
  • Silicon
  • Steel
  • Glass
  • III-V
  • II-VI
All our Semiconductor furnaces

Do you have a question or a project ?

Would you like more information, to entrust us with a project or meet our teams ? Fill in our form and our teams will get back to you as soon as possible!

Contact us