Technical specifications
Features
- Modular and flexible & tiny footprint
- 1 to 4 independent process chambers
- Configurable for 25/50 or 50/100 wafers per chamber
- Manual or automatic boat loading
- Minimize heat load around the system
- Teflon type, Oil type or Dry pump
- Compatible with 156X square substrate (PV)
- Multi-zone heating element
- Atmospheric or vacuum process capability
- Gas Cabinet for up to 13 gases
- Liquid source precursor Cabinet and vaporisation
- SEMCO Mycro process Management software
Temperature range
Up to 1100°C (1200°C upon request)
Overall dimensions
(L*W*H) 1500*800*1500 mm
Spike and profile thermocouple control
Loading platform, Handling tool
Substrate size
100-200-300 MM
Options
- Primary vacuum pump & Secondary vacuum pump
- Atmospheric configuration (reduced, low pressure or ultra-high vacuum)
- Wet oxidation
- By-product treatment systems
- Turbomolecular pumping assembly
- Water cooling unit
Industry
- Medical
- Aeronautic
- Semiconductor
- Optoelectronic
- Microelectronics
- Fiber optic
Material
- Ceramics
- Glass
- III-V
- II-VI
- Sapphire
- Superconductors
- GaN
- SiC
- Meta
- Quartz
- Silicon