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Edge-defined film-fed growth furnace

Edge-defined film-fed growth (EFG)

ECM Lab Solutions offers crystal growth equipment that is capable of growing sapphire crystals using the Edge Defined Film Fed Crystal Growth (EFG) method. The standard heating method is inductive; however, it can also be equipped with Cyberstar resistive heating elements. Several sizes are available to meet with laboratories requirements as well as R&D centers.

Technical specifications

Features

  • Various crystal sizes up to 60 Kg
  • Precise pressure regulation system
  • Equipped with quartz or sapphire window view ports
  • Resistive or inductive heating
  • Operating security loop system
  • Fully computerized heating process
  • Chamber capabilities for primary and secondary vacuum

Cyberstar precise pulling head

Translation speed from 0.01 mm/h to 100 mm/h and in fast mode up to 100 mm/min

Water cooled

Working temperature in the reactor up to 2600°C

Robotic integration

Robotic integration : with ECM Robotics

400*60*6 (L*W*T)
600*150*6 (L*W*T)

  • Weighing device up to 60 Kg
  • Added crucible translation (manual or automatic)
  • Controlled mass flow of different atmosphere gases
  • PV
  • Defense
  • SoG c-Si
  • Sapphire
  • Silicon
All our Crystal Growth furnaces

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