RAPID THERMAL CHEMICAL
VAPOR DEPOSITION (RTCVD)
Jetstar furnace, for RTCVD.
Jetstar
Standalone RTP
furnace
Standalone RTP furnace with multi-zone
control system.
Working principle of rapid thermal chemical vapor deposition
The rapid thermal deposition processes based on Chemical Vapor Deposition are named Rapid Thermal Chemical Vapor Deposition Processes (RTCVD).
In RTCVD, gases are injected and react with the surface of the fast heated substrate to form a thin layer.
Reaction gases are introduced at controlled rate into an atmospheric or low-pressure environment.
Several different gases may have to be supplied and programmed in various ratios to optimize these processes.
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